The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 2015
Filed:
Mar. 06, 2013
Applicant:
Kabushiki Kaisha Toshiba, Tokyo, JP;
Inventor:
Tetsuro Nozu, Tokyo, JP;
Assignee:
Kabushiki Kaisha Toshiba, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01); H01L 23/48 (2006.01); H01L 29/66 (2006.01); H01L 29/40 (2006.01); H01L 29/08 (2006.01); H01L 29/10 (2006.01);
U.S. Cl.
CPC ...
H01L 29/78 (2013.01); H01L 23/48 (2013.01); H01L 29/66477 (2013.01); H01L 29/407 (2013.01); H01L 29/66734 (2013.01); H01L 29/7813 (2013.01); H01L 29/0865 (2013.01); H01L 29/1095 (2013.01); H01L 2924/0002 (2013.01);
Abstract
The performance of power semiconductor device of partial gate type structure may be improved by providing the source region only adjacent the gate electrodes in the structure, and providing the contact spaced from the gate by the source. The device includes a plurality of field plate electrodes which extend inwardly of the drift layer, a second field plate electrode disposed between the contact and one of the first field plate electrodes, and a gate electrode located between the source and a second one of the first field plate electrode.