The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 2015
Filed:
Mar. 04, 2013
Kabushiki Kaisha Toshiba, Tokyo, JP;
Ayako Kawanishi, Kanagawa, JP;
Tsukasa Azuma, Kanagawa, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
According to the embodiments, a method for pattern formation includes: creating a first self-assembly material layer which contains a first segment and a second segment, on a substrate on which a guide layer is installed; creating a first self-assembled pattern in which the first self-assembly material layer is phase-separated, the pattern including a first area containing the first segment and a second area containing the second segment; creating a second self-assembly material layer which includes a third segment and a fourth segment, in the first self-assembled pattern; creating a second self-assembled pattern in which the second self-assembly material layer is phase-separated, and which includes a third area containing the third segment and a fourth area containing the fourth segment.