The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 17, 2015

Filed:

Sep. 04, 2008
Applicants:

Jung Wook Lee, Hwaseong-si, KR;

Young Hoon Park, Anseong-si, KR;

Inventors:

Jung Wook Lee, Hwaseong-si, KR;

Young Hoon Park, Anseong-si, KR;

Assignee:

Wonik IPS Co., Ltd., Pyeongtaek, Gyeonggi-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/44 (2006.01); H01L 21/285 (2006.01); C23C 8/24 (2006.01); C23C 16/06 (2006.01); C23C 16/56 (2006.01); C23C 28/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/28556 (2013.01); C23C 8/24 (2013.01); C23C 16/06 (2013.01); C23C 16/56 (2013.01); C23C 28/322 (2013.01); C23C 28/34 (2013.01);
Abstract

Provided are methods and apparatuses for manufacturing a multilayer metal thin film without additional heat treatment processes. The method of manufacturing a multilayer metal thin film including steps of: (a) forming a first metal layer on a substrate by flowing a first metal precursor into a first reaction container; and (b) forming a second metal layer on the first metal layer by flowing a second metal precursor into a second reaction container, wherein the step (b) is performed in a range of a heat treatment temperature of the first metal layer so that the second metal layer is formed as the first metal layer is heat-treated.


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