The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 2015
Filed:
Sep. 25, 2013
Supply apparatus which supplies radicals, lithography apparatus, and method of manufacturing article
Applicant:
Canon Kabushiki Kaisha, Tokyo, JP;
Inventor:
Shigeru Terashima, Utsunomiya, JP;
Assignee:
Canon Kabushiki Kaisha, , JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/20 (2013.01);
Abstract
A supply apparatus for supplying radicals includes: a generator arranged in a chamber and configured to generate radicals by activating a gas supplied into the chamber; and a transport pipe having one end connected to the chamber and the other end from which the generated radicals are discharged. The generator is configured to activate the gas with infrared light radiation accompanied. An inner surface of the transport pipe is formed into a patterned shape by which the infrared light exiting the other end is less than the infrared light entering the one end.