The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 17, 2015

Filed:

Apr. 12, 2012
Applicants:

Tetsuo Okuyama, Otsu, JP;

Kazuyuki Ouya, Otsu, JP;

Toshiyuki Tsuchiya, Otsu, JP;

Naoki Watanabe, Otsu, JP;

Satoshi Maeda, Otsu, JP;

Inventors:

Tetsuo Okuyama, Otsu, JP;

Kazuyuki Ouya, Otsu, JP;

Toshiyuki Tsuchiya, Otsu, JP;

Naoki Watanabe, Otsu, JP;

Satoshi Maeda, Otsu, JP;

Assignee:

Toyobo Co., Ltd., Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 3/00 (2006.01); B32B 38/10 (2006.01); B29C 65/14 (2006.01); B29C 65/76 (2006.01); B29C 65/00 (2006.01); B29C 65/02 (2006.01); C08G 73/10 (2006.01); C08G 73/22 (2006.01); C08L 79/08 (2006.01); B32B 7/06 (2006.01); B32B 38/00 (2006.01); B29C 59/14 (2006.01); B29C 35/08 (2006.01);
U.S. Cl.
CPC ...
B32B 38/10 (2013.01); B29C 65/1432 (2013.01); B29C 65/1496 (2013.01); B29C 65/76 (2013.01); B29C 66/028 (2013.01); B29C 66/1122 (2013.01); B29C 66/43 (2013.01); B29C 66/71 (2013.01); B29C 66/7465 (2013.01); B29C 66/919 (2013.01); B29C 65/02 (2013.01); C08G 73/1085 (2013.01); C08G 73/22 (2013.01); C08L 79/08 (2013.01); B29C 65/1406 (2013.01); B32B 7/06 (2013.01); B32B 38/0004 (2013.01); C08G 73/105 (2013.01); C08G 73/1067 (2013.01); C08G 73/1071 (2013.01); B29C 66/41 (2013.01); B29C 66/9141 (2013.01); B29C 66/91445 (2013.01); B29C 59/14 (2013.01); B29C 2035/0827 (2013.01); B32B 38/0008 (2013.01); B32B 2315/08 (2013.01); B32B 2379/08 (2013.01); B29C 66/9121 (2013.01); B29C 66/91216 (2013.01); B29C 66/91311 (2013.01); B29C 66/91313 (2013.01); B29C 66/91315 (2013.01);
Abstract

The invention provides a laminate of a substrate, a polyimide film, and a coupling treatment layer interposed therebetween, which provides different delamination strengths between the substrate and the polyimide film to form a prescribed pattern. The invention also provides a method for producing such a laminate formed from at least a substrate and a polyimide film, whereby, using a film obtained by plasma treatment of at least the surface facing the substrate as the polyimide film, coupling agent treatment is performed on at least one of the surfaces facing the substrate and the polyimide film to form a coupling treatment layer, deactivation treatment is performed on a portion of the coupling treatment layer to form a pre-determined pattern, and then pressing and heating are performed with the substrate and polyimide film overlapping.


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