The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 2015
Filed:
Oct. 29, 2009
Applicant:
Kunihiko Kodama, Haibara-gun, JP;
Inventor:
Kunihiko Kodama, Haibara-gun, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 3/00 (2006.01); C08F 259/08 (2006.01); B82Y 10/00 (2011.01); B82Y 40/00 (2011.01); C08F 265/00 (2006.01); C08F 265/04 (2006.01); C08F 283/12 (2006.01); C08L 51/00 (2006.01); C09D 183/10 (2006.01); G03F 7/00 (2006.01); G03F 7/004 (2006.01); G03F 7/033 (2006.01); G03F 7/075 (2006.01);
U.S. Cl.
CPC ...
C08F 259/08 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); C08F 265/00 (2013.01); C08F 265/04 (2013.01); C08F 283/12 (2013.01); C08L 51/003 (2013.01); C09D 183/10 (2013.01); G03F 7/0002 (2013.01); G03F 7/0046 (2013.01); G03F 7/033 (2013.01); G03F 7/0758 (2013.01);
Abstract
A composition for imprints comprising a polymerizable monomer, a photopolymerization initiator, and a polymer having a functional group with at least one of a fluorine atom or a silicon atom and having a polymerizable functional group, wherein the polymer has a weight-average molecular weight of at least 2000 and the amount of the polymer is from 0.01 to 20% by mass relative to the polymerizable monomer, is excellent in patternability and mold releasability, capable of forming good patterns and free from a problem of mold contamination.