The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 2015
Filed:
Mar. 15, 2010
Wlodzimierz W. Zmierczak, Salt Lake City, UT (US);
Jan Dean Miller, Salt Lake City, UT (US);
Raj Rajamani, Salt Lake City, UT (US);
Steven Messiter, Brisbane, AU;
Nicholas Drinnan, Brisbane, AU;
Edward Choros, Brisbane, AU;
Wlodzimierz W. Zmierczak, Salt Lake City, UT (US);
Jan Dean Miller, Salt Lake City, UT (US);
Raj Rajamani, Salt Lake City, UT (US);
Steven Messiter, Brisbane, AU;
Nicholas Drinnan, Brisbane, AU;
Edward Choros, Brisbane, AU;
University of Utah Research Foundation, Salt Lake City, UT (US);
Ambre Energy Limited, Brisbane, AU;
Abstract
A method of reacting compounds can include directing a liquid into a helical constrained flow () having an inner circumferential flow surface and an outer circumferential flow surface. The helical constrained flow () can be formed around an axial interior volume (). At least a portion of the helical constrained flow can be exposed to a sparging portion () to allow a fluid to be sparged into the liquid along the helical constrained flow (). The fluid reactant can be sparged through the helical constrained flow so as to form a fluid product.