The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 10, 2015

Filed:

Nov. 21, 2012
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Eung-Kyu Lee, Seoul, KR;

Jae-June Jang, Hwaseong-si, KR;

Hoon Chang, Hwaseong-si, KR;

Min-Hwan Kim, Hwaseong-si, KR;

Sung-Ryoul Bae, Hwaseong-si, KR;

Dong-Eun Jang, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01); H01L 29/66 (2006.01); H01L 29/08 (2006.01); H01L 29/10 (2006.01); H01L 29/06 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7816 (2013.01); H01L 29/66681 (2013.01); H01L 29/0878 (2013.01); H01L 29/1095 (2013.01); H01L 29/0653 (2013.01); H01L 29/0696 (2013.01);
Abstract

A semiconductor device includes a semiconductor substrate of a first conductivity type, a buried layer a second conductivity type different from the first conductivity type on the substrate and an epitaxial layer of the second conductivity type on the buried layer. The device further includes a pocket well of the first conductivity type in the epitaxial layer, a first drift region in the epitaxial layer at least partially overlapping the pocket well, a second drift region in the epitaxial layer and spaced apart from the first drift region, and a body region of the first conductivity type in the pocket well. A gate electrode is disposed on the body region, the pocket well and the first drift region and has an edge overlying the epitaxial region between the first and second drift regions.


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