The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 2015
Filed:
Oct. 24, 2011
Ligui Zhou, Saratoga, CA (US);
Richard A. Spear, Santa Cruz, CA (US);
Roger Yu-kwan Leung, San Jose, CA (US);
Wenya Fan, Campbell, CA (US);
Helen X. Xu, Sunnyvale, CA (US);
Lea M. Metin, San Jose, CA (US);
Anil Shriram Bhanap, Milpitas, CA (US);
Ligui Zhou, Saratoga, CA (US);
Richard A. Spear, Santa Cruz, CA (US);
Roger Yu-Kwan Leung, San Jose, CA (US);
Wenya Fan, Campbell, CA (US);
Helen X. Xu, Sunnyvale, CA (US);
Lea M. Metin, San Jose, CA (US);
Anil Shriram Bhanap, Milpitas, CA (US);
Honeywell International Inc., Morristown, NJ (US);
Abstract
Dopant ink compositions for forming doped regions in semiconductor substrates and methods for fabricating dopant ink compositions are provided. In an exemplary embodiment, a dopant ink composition comprises a dopant compound including at least one alkyl group bonded to a Group 13 element or a Group 15 element. Further, the dopant ink composition includes a silicon-containing compound.