The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 10, 2015

Filed:

Oct. 07, 2011
Applicants:

Nicholas S. Ergang, Glen Ellyn, IL (US);

Bruce A. Keiser, Plainfield, IL (US);

Richard Mimna, Aurora, IL (US);

Brett Showalter, Wheaton, IL (US);

Ian Saratovsky, Highland Park, IL (US);

Hung-ting Chen, Naperville, IL (US);

Inventors:

Nicholas S. Ergang, Glen Ellyn, IL (US);

Bruce A. Keiser, Plainfield, IL (US);

Richard Mimna, Aurora, IL (US);

Brett Showalter, Wheaton, IL (US);

Ian Saratovsky, Highland Park, IL (US);

Hung-Ting Chen, Naperville, IL (US);

Assignee:

Nalco Company, Naperville, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B 33/02 (2006.01); C01F 7/00 (2006.01); C01B 33/12 (2006.01); C01B 33/141 (2006.01); C01B 33/18 (2006.01); C09C 1/02 (2006.01); C09C 1/30 (2006.01); C01B 33/187 (2006.01);
U.S. Cl.
CPC ...
C01B 33/12 (2013.01); C01B 33/1415 (2013.01); C01B 33/18 (2013.01); C09C 1/02 (2013.01); C09C 1/3081 (2013.01); C01B 33/187 (2013.01); C01P 2002/54 (2013.01); C01P 2006/12 (2013.01); C01P 2006/14 (2013.01); C01P 2006/16 (2013.01);
Abstract

Methods of forming a silica-containing products are disclosed. One method comprises: (a) providing a silica containing precursor (SCP) contained in solution that has a pH less than or equal to a pH of 7; (b) optionally doping the SCP with one or more metal species; (d) adding an effective amount of salt to the solution so that the conductivity of the solution is greater than or equal to 4 mS; (e) optionally filtering and drying the SCP; and (f) optionally reacting the dried product from step e with a functional group. Another method comprises: (a) providing a silica containing precursor (SCP) contained in solution that has a pH greater than 7; (b) adjusting the pH of the solution to less than or equal to 7; (c) optionally doping the SCP with one or more metal species; (d) adjusting the pH of the solution to greater than 7; and (e) adding an effective amount of salt to the solution so that the conductivity of the solution is greater than or equal to 4 mS; (f) optionally filtering and drying the SCP. The SCP is then added to a hygroscopic solid such that the resulting product comprises a metal oxide-doped or metal sulfide-doped silica-containing product deposited on a substrate selected from hydrated alkaline earth oxide, lanthanide oxide, and combinations thereof.


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