The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 2015
Filed:
Sep. 30, 2013
Applicant:
Shanghai Huali Microelectronics Corporation, Shanghai, CN;
Assignee:
Shanghia Huali Microelectronics Corporation, Shanghai, CN;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25F 1/00 (2006.01); C23C 16/44 (2006.01); B08B 5/00 (2006.01); B08B 7/00 (2006.01); B08B 9/00 (2006.01); B08B 9/027 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4405 (2013.01); C23C 16/4404 (2013.01); C23C 16/4408 (2013.01); B08B 5/00 (2013.01); B08B 7/0035 (2013.01); B08B 9/00 (2013.01); B08B 9/027 (2013.01); Y10S 134/902 (2013.01);
Abstract
The present invention discloses a method of reducing contamination in a CVD chamber. The method comprises cleaning the CVD chamber with first cleaning gases containing NF; removing the particles in the CVD chamber with second cleaning gases containing N; further removing the particles in the CVD chamber with third cleaning gases containing O; and seasoning an amorphous carbon layer with mixed gases containing CHand an inert gas.