The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 10, 2015

Filed:

Mar. 29, 2013
Applicants:

J. Louis Kovach, Lewis Center, OH (US);

Clinton B. Summers, Westerville, OH (US);

Inventors:

J. Louis Kovach, Lewis Center, OH (US);

Clinton B. Summers, Westerville, OH (US);

Assignee:

VaporLok Technology, LLC, Mankato, MN (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B01D 53/64 (2006.01); B65D 85/42 (2006.01); B01D 53/04 (2006.01); B01D 53/82 (2006.01);
U.S. Cl.
CPC ...
B65D 85/42 (2013.01); B01D 53/64 (2013.01); B01D 2257/602 (2013.01); B01D 53/04 (2013.01); B01D 53/82 (2013.01);
Abstract

Disclosed is an Hg capture system adapted for advantageous placement within a container housing a fluorescent lamp. Such Hg capture system includes a substrate impregnated with between about 0.08 and 0.23 g/cmcarbon carrying between about 5% and 15% sulfur, basis carbon weight, reacted with between about 0.02 to about 1% by weight iodine, basis sulfur weight. The corresponding method for scouring released vaporous Hg housed within a container includes providing a source of carbon carrying between about 5% and 15% sulfur, basis carbon weight, reacted with between about 0.02 to about 1% by weight iodine, basis sulfur weight; and placing within the container a substrate bearing an effective amount of the iodine reacted sulfur for scouring Hg released within the container.


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