The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 2015
Filed:
Dec. 10, 2007
Wook Seong Lee, Seoul, KR;
Young Joon Baik, Seoul, KR;
Jong-keuk Park, Seoul, KR;
Gyu Weon Hwang, Seoul, KR;
Jeung-hyun Jeong, Seoul, KR;
Wook Seong Lee, Seoul, KR;
Young Joon BaiK, Seoul, KR;
Jong-Keuk Park, Seoul, KR;
Gyu Weon Hwang, Seoul, KR;
Jeung-hyun Jeong, Seoul, KR;
Korea Institute of Science and Technology, Seoul, KR;
Abstract
A plasma deposition apparatus includes a cathode assembly including a cathode disk and a water-coolable cathode holder supporting the cathode disk, an anode assembly including a water-coolable anode holder, a substrate mounted on the anode holder to serve as an anode, and a substrate holder mounting and supporting the substrate, and a reactor for applying a potential difference between opposing surfaces of the cathode assembly and the anode assembly under a vacuum state to form plasma of a raw gas. The cathode disk comes into thermal contact with the cathode holder using at least one of a self weight and a vacuum absorption force so as to permit thermal expansion of the cathode disk.