The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 03, 2015

Filed:

Aug. 24, 2010
Applicants:

Shigehiro Nukatsuka, Tokyo, JP;

Akiyoshi Sato, Tokyo, JP;

Takeshi Adachi, Tokyo, JP;

Kotaro Nariki, Tokyo, JP;

Inventors:

Shigehiro Nukatsuka, Tokyo, JP;

Akiyoshi Sato, Tokyo, JP;

Takeshi Adachi, Tokyo, JP;

Kotaro Nariki, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 19/00 (2011.01); G08B 21/12 (2006.01); G06Q 10/04 (2012.01); G08B 31/00 (2006.01);
U.S. Cl.
CPC ...
G08B 21/12 (2013.01); G06Q 10/04 (2013.01); G08B 31/00 (2013.01);
Abstract

By using information collected on-site, estimation of a damage area at that time and also prediction regarding subsequent expansion of a disaster-affected area are performed. The estimation device includes a storage unit that stores an exposure calculation formula expressing an exposure amount, which is an integrated value of the concentration of a material with respect to time, at a certain time and a certain position, by using the diffusivity and flow rate of the material; an information-acquisition unit that acquires position information of disaster victims at a prescribed time as input information; and a calculation unit that obtains a critical value of the exposure amount by applying the position information of each disaster victim at the prescribed time to the exposure calculation formula and that specifies the disaster-affected area at the prescribed time on the basis of the exposure calculation formula for when the critical value is obtained.


Find Patent Forward Citations

Loading…