The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2015
Filed:
Apr. 16, 2013
International Business Machines Corporation, Armonk, NY (US);
Daiju Nakano, Kanagawa-ken, JP;
Masao Tokunari, Kanagawa, JP;
Kazushige Toriyama, Kanagawa, JP;
Yutaka Tsukada, Shiga, JP;
International Business Machines Corporation, Armonk, NY (US);
Abstract
Spacer resin pattern layer which precisely aligns a light-emitting element or a light-receiving element relative to both a waveguide pattern layer and electrical circuit pattern layer from the semiconductor wafer level. A substratum of resin having a through-hole provided for electrical communication with an electrical circuit pattern layer is formed on a semiconductor wafer. A truncated cone-shaped three-dimensional reflective surface is formed to guide the emitted light towards or received light from a waveguide pattern layer. A metal film is deposited planarly in a predetermined range from the center when positioned relative to the position of the through-hole. A truncated cone-shaped mold is stamped in the center. By modifying the direction of the light using this tapered structure, the precision tolerance is increased and optical loss is reduced.