The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2015
Filed:
Dec. 23, 2013
Applicant:
Headway Technologies, Inc., Milpitas, CA (US);
Inventors:
Lijie Guan, San Jose, CA (US);
Po-Kang Wang, Los Altos, CA (US);
Moris Dovek, San Jose, CA (US);
Joe Smyth, Aptos, CA (US);
Kenichi Takano, Cupertino, CA (US);
Yoshitaka Sasaki, Santa Clara, CA (US);
Assignee:
Headway Technologies, Inc., Milpitas, CA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/23 (2006.01); G11B 5/31 (2006.01); G11B 5/127 (2006.01);
U.S. Cl.
CPC ...
G11B 5/1278 (2013.01); G11B 5/3116 (2013.01); G11B 5/3146 (2013.01);
Abstract
A structure and a process for a perpendicular write pole that provides increased magnetic flux at the ABS is disclosed. This is accomplished by increasing the amount of write flux that originates above the write gap, without changing the pole taper at the ABS. Three embodiment of the invention are discussed.