The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 03, 2015

Filed:

May. 25, 2011
Applicants:

William X. Yang, Sammamish, WA (US);

Dahey Yoo, Bellevue, WA (US);

Inventors:

William X. Yang, Sammamish, WA (US);

Dahey Yoo, Bellevue, WA (US);

Assignee:

Microsoft Corporation, Redmond, WA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H04N 7/00 (2011.01); H04N 5/232 (2006.01); H04N 5/76 (2006.01); G03B 17/18 (2006.01);
U.S. Cl.
CPC ...
H04N 5/23232 (2013.01); H04N 5/76 (2013.01); G03B 17/18 (2013.01); H04N 5/23238 (2013.01);
Abstract

A field sensor may be capable of generating a panoramic field, e.g., by instructing the user to capture a sequence of fields of the panorama, performing a field evaluation to identify one or more landmarks depicted in overlapping areas of two contiguous fields, performing a field registration therebetween, and stitching together the panoramic field. However, panoramic field stitching based on field evaluation may fail to register two fields accurately or at all. Rather, panoramic field stitching may be performed using a device having an orientation sensor that detects the orientation of the device while capturing each field with a field sensor. The detected orientation may be used to orient the fields within a projection, from which a panoramic field may be accurately stitched. Additional variations include stitching together projections of the panorama captured at different times and utilizing fields captured at a distance from the root location of the panorama.


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