The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2015
Filed:
Apr. 21, 2011
Leslie M. Landsberger, Westmount, CA;
Oleg Grudin, Montreal, CA;
Jens Urban, Erfurt, DE;
Uwe Schwarz, Niedernissa, DE;
Leslie M. Landsberger, Westmount, CA;
Oleg Grudin, Montreal, CA;
Jens Urban, Erfurt, DE;
Uwe Schwarz, Niedernissa, DE;
Sensortechnics GmbH, Puchheim, DE;
Abstract
There is described a method for creating a thermally-isolated microstructure on a slab of mono-crystalline silicon which uses a hybrid dry-then-wet etch technique that when controlled, can produce microstructures without any silicon adhering underneath, microstructures having small masses of silicon adhering underneath, and microstructures that are still attached to the slab of mono-crystalline silicon via a waisted silicon body. When creating the microstructures with a waisted silicon body, the thermal isolation of the microstructure can be designed by controlling the depth of the etching and the size of the waist.