The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2015
Filed:
Jan. 11, 2012
Emmanuel Atta, Rochester, MN (US);
Darcy Berger, Rochester, MN (US);
John R. Dangler, Rochester, MN (US);
Matthew S. Doyle, Rochester, MN (US);
Jesse Hefner, Rochester, MN (US);
Thomas W. Liang, Rochester, MN (US);
Emmanuel Atta, Rochester, MN (US);
Darcy Berger, Rochester, MN (US);
John R. Dangler, Rochester, MN (US);
Matthew S. Doyle, Rochester, MN (US);
Jesse Hefner, Rochester, MN (US);
Thomas W. Liang, Rochester, MN (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method, system and computer program product for implementing an enhanced optical mirror coupling and alignment mechanism utilizing two-photon resist. An initial placement is provided for one or more vias on a printed circuit board. A via is filled with a resist. A series of tightly focused light beams suitably exposes the resist at varying depths in the via, the varying depths defining a sloped polymer in the via after removing resist that had not been at the focus of the light beam. The sloped polymer is coated with reflective material to reflect light into or out of the via.