The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2015
Filed:
Sep. 18, 2012
Applicants:
Imec, Leuven, BE;
Universiteit Gent, Ghent, BE;
Inventors:
Frederik Goethals, Evergem, BE;
Pascal Van Der Voort, Wilrijk, BE;
Isabel Van Driessche, Waasmunster, BE;
Mikhail Baklanov, Veltem-Beisem, BE;
Assignees:
IMEC, Leuven, BE;
Universiteit Gent, Ghent, BE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 3/26 (2006.01); H01L 23/58 (2006.01); H01L 21/31 (2006.01); H01L 21/3105 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/31058 (2013.01); H01L 21/3105 (2013.01); H01L 21/02126 (2013.01); H01L 21/02203 (2013.01); H01L 21/02362 (2013.01);
Abstract
A method for at least partially sealing a porous material is provided, comprising forming a sealing layer onto the porous material by applying a sealing compound comprising oligomers wherein the oligomers are formed by ageing a precursor solution comprising cyclic carbon bridged organosilica and/or bridged organosilanes. The method is especially designed for low k dielectric porous materials to be incorporated into semiconductor devices.