The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2015
Filed:
May. 18, 2009
Applicants:
Shunpei Yamazaki, Tokyo, JP;
Takeshi Fukunaga, Kanagawa, JP;
Inventors:
Shunpei Yamazaki, Tokyo, JP;
Takeshi Fukunaga, Kanagawa, JP;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 5/06 (2006.01); C23C 16/04 (2006.01); H01L 51/00 (2006.01); C23C 14/04 (2006.01); C23C 14/24 (2006.01); C23C 14/56 (2006.01); H01L 27/32 (2006.01); H01L 51/50 (2006.01);
U.S. Cl.
CPC ...
H01L 51/0011 (2013.01); C23C 14/044 (2013.01); C23C 14/243 (2013.01); C23C 14/564 (2013.01);
Abstract
Disclosed is an evaporation method to form a thin film over a substrate, which is characterized in the use of an evaporation source equipped with a plurality of evaporation cells. The evaporation source has a rectangular shape with a long side and a short side wherein the long side is longer than the short side. At least one of the evaporation source and the substrate is relatively moved during the evaporation, which allows the formation of a thin film having a highly uniform thickness in a short time.