The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2015
Filed:
Jun. 20, 2012
J. Gary Eden, Champaign, IL (US);
Sung-jin Park, Champaign, IL (US);
Jin Hoon Cho, Champaign, IL (US);
Seung Hoon Sung, Beaverton, OR (US);
Min Hwan Kim, Urbana, IL (US);
J. Gary Eden, Champaign, IL (US);
Sung-Jin Park, Champaign, IL (US);
Jin Hoon Cho, Champaign, IL (US);
Seung Hoon Sung, Beaverton, OR (US);
Min Hwan Kim, Urbana, IL (US);
The Board of Trustees of the University of Illinois, Urbana, IL (US);
Abstract
A microplasma device of the invention includes a microcavity or microchannel defined at least partially within a thick metal oxide layer consisting essentially of defect free oxide. Electrodes are arranged with respect to the microcavity or microchannel to stimulate plasma generation in said microcavity or microchannel upon application of suitable voltage and at least one of the electrodes is encapsulated within the thick metal oxide layer. Large arrays can be formed and are highly robust as lack of microcracks in the oxide avoid dielectric breakdown.