The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 03, 2015

Filed:

Jun. 18, 2007
Applicants:

Adolph Miller Allen, Oakland, CA (US);

Ki Hwan Yoon, San Jose, CA (US);

Ted Guo, Palo Alto, CA (US);

Hong S. Yang, Pleasanton, CA (US);

Sang-ho Yu, Cupertino, CA (US);

Inventors:

Adolph Miller Allen, Oakland, CA (US);

Ki Hwan Yoon, San Jose, CA (US);

Ted Guo, Palo Alto, CA (US);

Hong S. Yang, Pleasanton, CA (US);

Sang-Ho Yu, Cupertino, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/35 (2006.01); C23C 14/34 (2006.01); H01J 37/34 (2006.01);
U.S. Cl.
CPC ...
C23C 14/3407 (2013.01); H01J 37/3423 (2013.01); H01J 37/3435 (2013.01);
Abstract

A sputtering target for a sputtering chamber comprises a backing plate with a sputtering plate mounted thereon. In one version, the backing plate comprises a circular plate having a front surface comprising an annular groove. The sputtering plate comprises a disk comprising a sputtering surface and a backside surface having a circular ridge that is shaped and sized to fit into the annular groove of the backing plate.


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