The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 24, 2015

Filed:

Apr. 09, 2012
Applicant:

Yuichi Seki, Saitama, JP;

Inventor:

Yuichi Seki, Saitama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J 2/435 (2006.01); B41J 2/47 (2006.01); G03G 15/043 (2006.01); H04N 1/113 (2006.01); H04N 1/12 (2006.01); H04N 1/191 (2006.01);
U.S. Cl.
CPC ...
G03G 15/043 (2013.01); H04N 1/1135 (2013.01); H04N 1/12 (2013.01); H04N 1/191 (2013.01); H04N 2201/0082 (2013.01);
Abstract

An exposure apparatus according to this invention uses both a first light source which outputs a light beam corresponding to a drive current corresponding to image information, and a second light source to irradiate the surface of a photosensitive drum with a plurality of light beams. The second laser light source irradiates the photosensitive drum with a laser beam in accordance with a drive current corresponding to a correction value according to which unevenness of potential characteristics due to unevenness of sensitivity of the surface of the photosensitive drum is reduced. The same region on the surface of the photosensitive drum is irradiated with laser beams which are output from the first and second laser light sources onto the photosensitive drum in superposition.


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