The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 24, 2015

Filed:

Mar. 11, 2013
Applicant:

Kabushiki Kaisha Toshiba, Tokyo, JP;

Inventors:

Masahiko Kuraguchi, Kanagawa-ken, JP;

Akira Yoshioka, Kanagawa-ken, JP;

Yoshiharu Takada, Kanagawa-ken, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 29/812 (2006.01); H01L 29/205 (2006.01); H01L 29/49 (2006.01); H01L 29/778 (2006.01); H01L 29/423 (2006.01); H01L 29/45 (2006.01); H01L 29/20 (2006.01);
U.S. Cl.
CPC ...
H01L 29/812 (2013.01); H01L 29/205 (2013.01); H01L 29/66863 (2013.01); H01L 29/4958 (2013.01); H01L 29/4966 (2013.01); H01L 29/7787 (2013.01); H01L 29/42376 (2013.01); H01L 29/452 (2013.01); H01L 29/2003 (2013.01);
Abstract

According to one embodiment, a nitride semiconductor device includes a substrate; semiconductor stacked layers including a nitride semiconductor provided on the substrate, and having a buffer layer, a carrier running layer provided on the buffer layer, and a barrier layer provided on the carrier running layer; a source electrode and a drain electrode provided on the semiconductor stacked layers and in contact with the semiconductor stacked layers; and a gate electrode provided on the semiconductor stacked layers and provided between the source electrode and the drain electrode. The gate electrode has a stacked structure, and a gate metal layer, a barrier metal layer, a first interconnection layer, and a second interconnection layer including Al are sequentially stacked from a side of a surface of the semiconductor stacked layers in the stacked structure.


Find Patent Forward Citations

Kuraguchi, Masahiko. (2015). Nitride semiconductor device and method for manufacturing same (U.S. Patent No. 8963203). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8963203

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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