The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 2015
Filed:
Jul. 28, 2011
John G. Hagopian, Harwood, MD (US);
Jeffrey C. Livas, Severna Park, MD (US);
Shahram R. Shiri, Glyndon, MD (US);
Stephanie A. Getty, Washington, DC (US);
June L Tveekrem, Columbia, MD (US);
James J. Butler, Laurel, MD (US);
John G. Hagopian, Harwood, MD (US);
Jeffrey C. Livas, Severna Park, MD (US);
Shahram R. Shiri, Glyndon, MD (US);
Stephanie A. Getty, Washington, DC (US);
June L Tveekrem, Columbia, MD (US);
James J. Butler, Laurel, MD (US);
Abstract
Disclosed herein is a system for an apodization mask composed of multi-walled carbon nanotubes (MWCNTs) for absorbing unwanted stray light. An apodization mask is a precise pattern or shape that is mathematically derived using light scattering measurement techniques to achieve optimal light absorption. Also disclosed herein is an apparatus for a duplex telescope with stray light suppressing capabilities comprising: a primary mirror for transmitting and receiving light; a secondary mirror for defocusing transmitted light onto the primary mirror and for focusing received light; a photodetector which receives light; a laser transmitter which transmits light; and an apodization mask for absorbing stray transmitted light.