The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 24, 2015

Filed:

Jul. 02, 2012
Applicants:

Mi-young Kim, Uiwang-si, KR;

Woo-jin Lee, Uiwang-si, KR;

Kwen-woo Han, Uiwang-si, KR;

Han-song Lee, Uiwang-si, KR;

Sang-kyun Kim, Uiwang-si, KR;

Jong-seob Kim, Uiwang-si, KR;

Inventors:

Mi-Young Kim, Uiwang-si, KR;

Woo-Jin Lee, Uiwang-si, KR;

Kwen-Woo Han, Uiwang-si, KR;

Han-Song Lee, Uiwang-si, KR;

Sang-Kyun Kim, Uiwang-si, KR;

Jong-Seob Kim, Uiwang-si, KR;

Assignee:

Cheil Industries, Inc., Gumi-si, Kyeongsangbuk-do, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08L 83/00 (2006.01); H01L 21/033 (2006.01); G03F 7/075 (2006.01); G03F 7/09 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0332 (2013.01); G03F 7/0752 (2013.01); G03F 7/091 (2013.01); H01L 21/02126 (2013.01); H01L 21/02216 (2013.01); H01L 21/02282 (2013.01);
Abstract

A resist underlayer composition includes a solvent, and an organosilane condensation polymerization product of: a compound represented by the following Chemical Formula 1, a compound represented by the following Chemical Formula 2, and a compound represented by the following Chemical Formula 3,[RO]Si—X  [Chemical Formula 1][RO]Si—R  [Chemical Formula 2][RO]Si—Si[OR].  [Chemical Formula 3]


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