The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 24, 2015

Filed:

Jan. 07, 2013
Applicant:

The Regents of the University of Colorado, a Body Corporate, Dover, CO (US);

Inventors:

Christopher N. Bowman, Boulder, CO (US);

Neil B. Cramer, Boulder, CO (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
A61F 2/00 (2006.01); A61K 6/02 (2006.01); A61K 6/08 (2006.01); A61K 6/087 (2006.01); A61K 6/00 (2006.01); C08J 7/12 (2006.01); C08G 75/04 (2006.01); C08F 2/48 (2006.01); C08F 2/50 (2006.01); C09D 4/00 (2006.01); C08F 222/10 (2006.01);
U.S. Cl.
CPC ...
A61K 6/00 (2013.01); C08J 7/123 (2013.01); C08G 75/045 (2013.01); C08F 2/48 (2013.01); C08F 2/50 (2013.01); C09D 4/00 (2013.01); C08F 222/1006 (2013.01);
Abstract

The invention includes a new photopolymerizable resin system for dental restorative materials. The resin system utilizes a thiol-ene component as the reactive diluent in dimethacrylate systems. The ternary resin system comprises a thiol monomer, an ene monomer and a dimethacrylate monomer. The system of the invention has enhanced overall functional group conversion, improved polymer mechanical properties, and reduced shrinkage stress of the ternary system when compared to either traditional dimethacrylate or thiol-ene resin systems.


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