The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 24, 2015

Filed:

Dec. 20, 2005
Applicants:

Akira Shibuya, Kawasaki, JP;

Hidemasa Aoki, Kawasaki, JP;

Makoto Saito, Kawasaki, JP;

Motoaki Kamachi, Kawasaki, JP;

Atsushi Tsuchiya, Toshima-ku, JP;

Akio Okamura, Toshima-ku, JP;

Inventors:

Akira Shibuya, Kawasaki, JP;

Hidemasa Aoki, Kawasaki, JP;

Makoto Saito, Kawasaki, JP;

Motoaki Kamachi, Kawasaki, JP;

Atsushi Tsuchiya, Toshima-ku, JP;

Akio Okamura, Toshima-ku, JP;

Assignee:

Showa Denko K.K., Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61K 8/46 (2006.01); A61Q 5/04 (2006.01); A61K 8/49 (2006.01);
U.S. Cl.
CPC ...
A61K 8/4933 (2013.01); A61Q 5/04 (2013.01);
Abstract

Provided are hair processing agents capable of permanent waving hair even at a neutral to weakly acidic pH range that causes less irritation to the skin, and hair processing agents in which an unpleasant odor is masked. Hair processing agents contain at least one compound represented by the formula (2). Hair processing agents contain a compound of the formula (2) and at least one compound (ii) selected from thioglycolic acid, thiolactic acid, cysteine, acetylcysteine, cysteamine, acylcysteamine, salts thereof and ester derivatives thereof. Hair processing agents contain a compound of the formula (2), a surfactant and water, and are emulsified. Hair processing agents contain a compound of the formula (2) and a specific perfume. wherein X is a structure selected from —O—, —S—, —NH— and —NR—; Ris an alkyl group of 1 to 6 carbon atoms; Y is an oxygen atom or a sulfur atom; in the formula (1), Z is a divalent organic residue having at least one mercapto group; in the formula (2), R is a divalent organic residue optionally having a mercapto group; and Ris a hydrogen atom or an alkyl group of 1 to 6 carbon atoms.


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