The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 2015
Filed:
Oct. 13, 2011
Applicants:
Peter Mardilovich, Corvallis, OR (US);
Anthony M. Fuller, Corvallis, OR (US);
Qingqiao Wei, Corvallis, OR (US);
Inventors:
Peter Mardilovich, Corvallis, OR (US);
Anthony M. Fuller, Corvallis, OR (US);
Qingqiao Wei, Corvallis, OR (US);
Assignee:
Hewlett-Packard Development Company, L.P., Houston, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01); B82Y 40/00 (2011.01); B81C 1/00 (2006.01);
U.S. Cl.
CPC ...
B44C 1/227 (2013.01); B82Y 40/00 (2013.01); B81C 1/00111 (2013.01); B81C 2201/0149 (2013.01); Y10S 977/70 (2013.01);
Abstract
A method of forming a nano-structured substrate is provided, the method comprising including forming non-integral nano-pillars on a substrate surface and directionally etching the substrate surface using the non-integral nano-pillars as a mask to form integral nano-structures in the substrate.