The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 2015
Filed:
Mar. 26, 2010
Jae-wan Park, Yongin, KR;
You-min Cha, Yongin, KR;
Jae-hong Ahn, Yongin, KR;
Won-seok Cho, Yongin, KR;
Jae-mork Park, Yongin, KR;
Min-jeong Hwang, Yongin, KR;
Jae-Wan Park, Yongin, KR;
You-Min Cha, Yongin, KR;
Jae-Hong Ahn, Yongin, KR;
Won-Seok Cho, Yongin, KR;
Jae-Mork Park, Yongin, KR;
Min-Jeong Hwang, Yongin, KR;
Samsung Display Co., Ltd., Giheung-Gu, Yongin, Gyeonggi-Do, KR;
Abstract
Provided is an evaporating apparatus that deposits a deposition material onto a treatment object. The evaporating apparatus includes a base, a deposition source, and first and second correction units. The deposition source deposits the deposition material onto the treatment object. The base is disposed separately from the treatment object. The deposition source is placed on a surface of the base. The first and second correction units located between the deposition source and the treatment object. The first and second correction units are disposed on outer regions of the deposition source and face each other. Each of the first and second correction units rotates to control the thickness of a layer formed by the deposition material deposited on the treatment object.