The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 2015
Filed:
May. 20, 2011
Applicants:
Phoi Chin Goh, Singapore, SG;
Kui Yao, Singapore, SG;
Inventors:
Phoi Chin Goh, Singapore, SG;
Kui Yao, Singapore, SG;
Assignee:
Agency for Science, Technology and Research, Singapore, SG;
Primary Examiner:
Int. Cl.
CPC ...
C04B 35/632 (2006.01); H01L 41/187 (2006.01); C01G 33/00 (2006.01); C04B 35/495 (2006.01); C04B 35/626 (2006.01); C04B 35/634 (2006.01); H01L 41/318 (2013.01);
U.S. Cl.
CPC ...
C04B 35/632 (2013.01); C01G 33/00 (2013.01); C01G 33/006 (2013.01); C04B 35/495 (2013.01); C04B 35/6264 (2013.01); C04B 35/63444 (2013.01); C04B 35/63488 (2013.01); H01L 41/1873 (2013.01); H01L 41/318 (2013.01); C01P 2002/50 (2013.01); C01P 2002/72 (2013.01); C01P 2002/89 (2013.01); C01P 2006/32 (2013.01); C01P 2006/40 (2013.01); C04B 2235/3201 (2013.01); C04B 2235/3203 (2013.01); C04B 2235/3255 (2013.01); C04B 2235/44 (2013.01); C04B 2235/441 (2013.01); C04B 2235/449 (2013.01);
Abstract
The present invention discloses a method of preparing a lead-free piezoelectric thin film comprising the steps of: providing a precursor solution comprising at least one alkali metal ion, a polyamine carboxylic acid, and an amine; depositing the precursor solution on a substrate to form a film; and annealing the film. The present invention also provides a lead-free piezoelectric thin film prepared according to the method, a precursor solution for use in the method and a method of preparing the precursor solution.