The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8960968 B1

PDF
Full Text
Expired
Date of Patent:
Feb. 24, 2015

Filed:

Sep. 16, 2011
Applicants:

Jerome Loicq, Villers-aux-Tours, BE;

Karl Fleury-frenette, Seraing, BE;

Denis Vandormael, Vezin, BE;

Inventors:

Jerome Loicq, Villers-aux-Tours, BE;

Karl Fleury-Frenette, Seraing, BE;

Denis Vandormael, Vezin, BE;

Assignee:

Universite de Liege, Angleur, BE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F21V 3/00 (2006.01); G02B 5/02 (2006.01); H01L 51/52 (2006.01); G01J 1/04 (2006.01);
U.S. Cl.
CPC ...
G02B 5/02 (2013.01); H01L 51/5268 (2013.01); G01J 1/0407 (2013.01); H01L 51/52 (2013.01);
Abstract

An object of the present invention is to provide a cheap, rapid, controlled, reproducible and polyvalent method for manufacturing a light emitting device with an internal source of light capable of achieving an enhancement in extraction efficiency. The invention proposes a method for manufacturing an optical layer for a light emitting device having an internal source of light and an optical layer separating the internal source of light and an external medium of light diffusion, wherein the method comprises the use of coherent electromagnetic radiation speckle lithography, such as laser speckle lithography, to make a nano/micro texturation on at least one surface of the optical layer.


Find Patent Forward Citations

Loicq, Jerome. (2015). Method of manufacturing an improved optical layer for a light emitting device with surface nano-micro texturation based on coherent electromagnetic radiation speckle lithography (U.S. Patent No. 8960968). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8960968

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