The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 2015
Filed:
Oct. 20, 2011
Applicants:
Kyu-dong Jung, Suwon-si, KR;
Seung-tae Choi, Hwaseong-si, KR;
Inventors:
Kyu-dong Jung, Suwon-si, KR;
Seung-Tae Choi, Hwaseong-si, KR;
Assignee:
Samsung Electronics Co., Ltd., Suwon-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05K 3/02 (2006.01); H05K 3/30 (2006.01); H01L 41/00 (2013.01); H02N 2/00 (2006.01); H01L 41/047 (2006.01); H01L 41/29 (2013.01); H01L 41/27 (2013.01); H01L 41/297 (2013.01); H01L 41/193 (2006.01);
U.S. Cl.
CPC ...
H01L 41/0478 (2013.01); H01L 41/29 (2013.01); H01L 41/0471 (2013.01); H01L 41/27 (2013.01); H01L 41/297 (2013.01); H01L 41/193 (2013.01);
Abstract
A method of manufacturing a polymer electrode is provided. The method includes adhering a shadow mask onto a substrate, forming a hydrophilic electrode pattern on the substrate, coating the hydrophilic electrode pattern of the substrate with a conductive polymer water solution, removing the shadow mask, and drying the conductive polymer water solution, thus forming the polymer electrode.