The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 17, 2015

Filed:

Sep. 30, 2009
Applicants:

Michael John Dutch, Saratoga, CA (US);

Christopher Hercules Claudatos, San Jose, CA (US);

William Dale Andruss, Minneapolis, MN (US);

Bruce David Leetch, Mason, OH (US);

Steven R. Terwilliger, Foster City, CA (US);

Inventors:

Michael John Dutch, Saratoga, CA (US);

Christopher Hercules Claudatos, San Jose, CA (US);

William Dale Andruss, Minneapolis, MN (US);

Bruce David Leetch, Mason, OH (US);

Steven R. Terwilliger, Foster City, CA (US);

Assignee:

EMC Corporation, Hopkinton, MA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 17/30 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method, article of manufacture, and apparatus for efficiently restoring a target system are disclosed. In some embodiments, a target is analyzed. A target profile is created based on the analysis. The target profile is then compared to a source profile. A profile difference is generated based on the comparison. The source image is modified based on the profile difference, and the modified image is then stored on the target. In some embodiments, modifying the source image may include removing or adding software components.


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