The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 17, 2015

Filed:

Aug. 01, 2011
Applicants:

Joanna N. Ptasinski, La Jolla, CA (US);

Lin Pang, San Diego, CA (US);

Pang-chen Sun, San Diego, CA (US);

Boris Slutsky, San Diego, CA (US);

Yeshaiahu Fainman, San Diego, CA (US);

Inventors:

Joanna N. Ptasinski, La Jolla, CA (US);

Lin Pang, San Diego, CA (US);

Pang-Chen Sun, San Diego, CA (US);

Boris Slutsky, San Diego, CA (US);

Yeshaiahu Fainman, San Diego, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01R 13/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A differential measurement design employing two nearly collinear optical beams provides surface plasmon polariton resonance (SPR) sensors and a corresponding method of increased dynamic range and signal to noise ratio. The differential measurement device and method based on wavelength interrogation, employs a single incident polarization state, and is combined with a 2-D nanohole array for operation at near-normal incidence, where this approach offers a decrease in the measurement time.


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