The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 17, 2015

Filed:

Sep. 02, 2010
Applicants:

Jun-woo Lee, Anyang-si, KR;

Jin-soo Jung, Hwaseong-si, KR;

Suk-hoon Kang, Seoul, KR;

Tae-ho Kim, Seoul, KR;

Soo-ryun Cho, Gunpo-si, KR;

Baek-kyun Jeon, Yongin-si, KR;

Inventors:

Jun-Woo Lee, Anyang-si, KR;

Jin-Soo Jung, Hwaseong-si, KR;

Suk-Hoon Kang, Seoul, KR;

Tae-Ho Kim, Seoul, KR;

Soo-Ryun Cho, Gunpo-si, KR;

Baek-Kyun Jeon, Yongin-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1337 (2006.01); G03F 1/00 (2012.01); G02F 1/1362 (2006.01); G02F 1/1343 (2006.01);
U.S. Cl.
CPC ...
G03F 1/144 (2013.01); G02F 1/133788 (2013.01); G02F 1/13624 (2013.01); G02F 2001/133746 (2013.01); G02F 2001/133757 (2013.01); G02F 2001/134345 (2013.01);
Abstract

A wide variety of different alignment polar angles can be created in the alignment layers of a liquid crystal display with just a small number of UV exposure steps by using one or a combination of overlappable UV masks, where the one or more combinations of overlappable UV masks simultaneously define a maximal transmission region, an intermediate transmission region and a nontransmitting (blocking) region. UV rays are irradiated through masks in different irradiation directions while the mask or masks are disposed in different orientations.


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