The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 17, 2015
Filed:
Jan. 15, 2013
Fujitsu Limited, Kanagawa, JP;
Yasuo Hidaka, Cupertino, CA (US);
Pradip Thachile, San Jose, CA (US);
Fujitsu Limited, Kawasaki-shi, JP;
Abstract
The present disclosure relates to a method of optimizing via cutouts, including selecting a geometry of a via cutout on a first ground reference layer adjacent to a first differential trace, the geometry selected to provide an extension region extending in the direction of the first differential trace. Additionally, the method includes the steps of selecting a geometry of the first differential trace, wherein a spacing of the first differential trace in the extension region is different from a spacing of the first differential trace outside the extension region, and selecting a radial dimension of a first and second via cutout on a second ground reference layer adjacent to and between the first and second differential traces, the radial dimension of the first via cutout and the second via cutout selected such that the second ground reference layer remains intact in the area adjacent the second differential trace.