The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 17, 2015
Filed:
Aug. 31, 2009
Applicants:
Jin Hyun Kim, San Jose, CA (US);
Michael Nam, San Jose, CA (US);
Jae Yeol Park, San Ramon, CA (US);
Jonggu Park, Gwangju-Si, KR;
Inventors:
Jin Hyun Kim, San Jose, CA (US);
Michael Nam, San Jose, CA (US);
Jae Yeol Park, San Ramon, CA (US);
Jonggu Park, Gwangju-Si, KR;
Assignee:
Semicat, Inc., Fremont, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 14/00 (2006.01); C23C 14/35 (2006.01); C23C 14/32 (2006.01); H01J 37/34 (2006.01);
U.S. Cl.
CPC ...
C23C 14/351 (2013.01); C23C 14/32 (2013.01); H01J 37/3405 (2013.01); H01J 37/3447 (2013.01);
Abstract
Embodiments of the invention relate generally to semiconductor device fabrication and processes, and more particularly, to an apparatus and a system for implementing arrangements of magnetic field generators configured to facilitate physical vapor deposition ('PVD') and/or controlling impedance matching associated with a non-metal-based plasma used to modify a non-metal film, such as a chalcogenide-based film.