The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 17, 2015
Filed:
Feb. 16, 2011
Applicant:
Masahiro Shibamoto, Yokohama, JP;
Inventor:
Masahiro Shibamoto, Yokohama, JP;
Assignee:
Canon Anelva Corporation, Kawasaki-shi, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/34 (2006.01); G11B 5/851 (2006.01); C23C 14/34 (2006.01);
U.S. Cl.
CPC ...
G11B 5/851 (2013.01); C23C 14/3464 (2013.01); H01J 37/3405 (2013.01); H01J 37/3429 (2013.01); H01J 37/347 (2013.01);
Abstract
Provided is a sputtering apparatus which can form a multilayer film giving high productivity and with less spiral pattern by effective use of targets, and a method of forming multilayer film using the apparatus. An embodiment is a multilayer-film sputtering apparatus comprising: a rotatable cathode unit () having cathodes (and) arranged on the same circumference with respect to the rotational center, and having a power-supply mechanism for supplying power to each cathode; a sensor () for detecting the position of cathode; and a rotation mechanism for rotating the cathode unit ().