The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 17, 2015
Filed:
Mar. 13, 2013
Applicant:
Mitsubishi Gas Chemical Company, Inc., Chiyoda-ku, JP;
Inventors:
Hiroshi Matsunaga, Tokyo, JP;
Kimihiro Aoyama, Tokyo, JP;
Assignee:
Mitsubishi Gas Chemical Company, Inc., Chiyoda-ku, JP;
Primary Examiner:
Int. Cl.
CPC ...
C11D 3/36 (2006.01); C11D 3/43 (2006.01); C11D 7/36 (2006.01); H01L 21/02 (2006.01); H01L 21/06 (2006.01); C09D 7/12 (2006.01); H01L 21/033 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
C09D 7/1233 (2013.01); H01L 21/0337 (2013.01); H01L 21/02068 (2013.01); H01L 21/31111 (2013.01);
Abstract
The objects of the present invention are to provide a treatment liquid able to inhibit pattern collapse in a microstructure such as a semiconductor device or a micromachine, as well as a method of manufacturing a microstructure using the same. Means to solve the problems is to treat a microstructure with a treatment liquid for inhibiting pattern collapse in a metal microstructure comprising an alkylphosphonic acid or salt thereof in which said alkyl moiety contains 6 to 18 carbon atoms, water, and a water soluble solvent.