The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 10, 2015

Filed:

Jun. 19, 2012
Applicants:

Yea-shuan Huang, Hsinchu, TW;

Kuo-ta Peng, Hsinchu, TW;

Inventors:

Yea-Shuan Huang, Hsinchu, TW;

Kuo-Ta Peng, Hsinchu, TW;

Assignee:

Chung Hua University, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for face recognition is provided with collecting a match facial image; retrieving a reference image from image records of a database or an input image; selecting one or more facial features from each of the match facial image and the reference image; obtaining at least one match facial feature and a match deviation of the reference image corresponding to the facial features of the match facial image; creating a match geometric model and a reference geometric model; obtaining a model deviation by comparing the match geometric model and the reference geometric model; and employing a match deviation and a model deviation to obtain a recognition score based on a predetermined rule. The method involves a two-way face recognition by integrating facial features of block matching with geometric model comparison. It employs relationship of match deviation and model deviation.


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