The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 10, 2015

Filed:

Apr. 15, 2011
Applicants:

Beng SO Ryu, Incheon-si, KR;

Byong Shik Lee, Gyeonggi-do, KR;

Hyeon Sam Jang, Gyeonggi-do, KR;

Bum Joong Kim, Gyeonggi-do, KR;

Inventors:

Beng So Ryu, Incheon-si, KR;

Byong Shik Lee, Gyeonggi-do, KR;

Hyeon Sam Jang, Gyeonggi-do, KR;

Bum Joong Kim, Gyeonggi-do, KR;

Assignees:

QMC Co., Ltd., Anyangsi, KR;

Beng So Ryu, Incheon, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); B23K 26/06 (2014.01); B23K 26/00 (2014.01); B23K 26/03 (2006.01); B23K 26/08 (2014.01);
U.S. Cl.
CPC ...
B23K 26/0635 (2013.01); B23K 26/0039 (2013.01); B23K 26/0057 (2013.01); B23K 26/032 (2013.01); B23K 26/0639 (2013.01); B23K 26/0853 (2013.01); B23K 2201/40 (2013.01);
Abstract

There is provided a laser processing method of a sapphire substrate including preparing a sapphire substrate on which plural stacked portions spaced from each other are formed, irradiating a short pulse laser beam from a laser light source, making the laser beam irradiated from the laser light source pass through a beam shaping module, adjusting a position of a light concentrating unit or the sapphire substrate such that the laser beam is concentrated to the inside of the sapphire substrate through the light concentrating unit, and forming a phase transformation area within the sapphire substrate by irradiating the laser beam into the sapphire substrate. The laser beam is introduced into the sapphire substrate while avoiding an area where the stacked portions are formed on the sapphire substrate, so that the phase transformation area is formed within the sapphire substrate.


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