The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 2015
Filed:
Feb. 28, 2011
Rena Tsuruoka, Hyogo, JP;
Hisao Ikeda, Kanagawa-ken, JP;
Takuya Tsurume, Kanagawa-ken, JP;
Tohru Sonoda, Osaka, JP;
Satoshi Inoue, Osaka, JP;
Rena Tsuruoka, Hyogo, JP;
Hisao Ikeda, Kanagawa-ken, JP;
Takuya Tsurume, Kanagawa-ken, JP;
Tohru Sonoda, Osaka, JP;
Satoshi Inoue, Osaka, JP;
Abstract
One embodiment of the present invention is a film forming method comprising: arranging a surface of a film formation substrateincluding an absorption layeron a first substrateand a material layercontaining a film formation material and a surface of a film-formation target substrateincluding a first layerover a second substrate, so as to face each other; forming a second layercontaining the film formation material over the first layerby performing first heat treatment on the material layer; and forming a third layercontaining the film formation material over the second layerby performing second heat treatment on the material layer. In the second heat treatment, energy with a density higher than that in the first heat treatment is applied to the material layer.