The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 2015
Filed:
Mar. 06, 2013
Applicant:
National Kaohsiung University of Applied Sciences, Kaohsiung, TW;
Inventors:
Chia-Chin Chiang, Kaohsiung, TW;
Chien-Chia Tseng, Keelung, TW;
Assignee:
National Kaohsiung University of Applied Science, Kaohsiung, TW;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/14 (2006.01); G03F 1/00 (2012.01);
U.S. Cl.
CPC ...
G03F 1/14 (2013.01);
Abstract
An adjustable photo-mask for providing variable properties includes a casing and a plate. The casing has a receiving room inside and a plurality of openings, with the openings extending from the receiving room to a front face of the casing. The plate has a plurality of through holes, with an axial direction of the through holes defined as a ray-transmission direction, with the plate slideably received in the receiving room, and with the through holes and the openings totally or partially overlapping in the ray-transmission direction.