The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 2015
Filed:
Feb. 10, 2012
Applicants:
Jeffrey W. Elam, Elmhurst, IL (US);
Angel Yanguas-gil, Naperville, IL (US);
Inventors:
Jeffrey W. Elam, Elmhurst, IL (US);
Angel Yanguas-Gil, Naperville, IL (US);
Assignee:
UChicago Argonne, LLC, Chicago, IL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); B05D 5/06 (2006.01); C23C 16/08 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C23C 16/08 (2013.01); C23C 16/45553 (2013.01);
Abstract
Systems and methods for producing a material of desired thickness. Deposition techniques such as atomic layer deposition are alter to control the thickness of deposited material. A funtionalization species inhibits the deposition reaction.
Elam, Jeffrey. (2015). Doping control by ald surface functionalization (U.S. Patent No. 8951615). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8951615
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile