The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 03, 2015

Filed:

Sep. 26, 2012
Applicant:

Emc Corporation, Hopkinton, MA (US);

Inventors:

Chaithanya Lekkalapudi, Palamaner, IN;

Sateesh Arvapally, Garidepally, IN;

Assignee:

EMC Corporation, Hopkinton, MA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/30 (2006.01);
U.S. Cl.
CPC ...
Abstract

Multi-dimensional logging for enterprise applications is described. A computer executes a logging mechanism. The logging mechanism receives, via a user interface, selections of log detail levels that range from a minimum log detail level to a maximum log detail level, of contexts that include at least two of an analytics context, a security context, a performance context, and a health context, and use cases that include at least two of an export use case, a save use case, an import use case, a check-in use case, and a check-out use case. The logging mechanism creates a multi-dimensional logging artifact based on selections of log detail levels, contexts, and use cases, and utilizes the multi-dimensional logging artifact with log data to create refined log data based on the selections of log detail levels, contexts, and use cases. The refined log data assists a user in evaluating an enterprise application.


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