The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2015
Filed:
Jan. 25, 2011
Alexander Viktorovych Padiy, Geldrop, NL;
Boris Menchtchikov, Eindhoven, NL;
Scott Anderson Middlebrooks, Duizel, NL;
Alexander Viktorovych Padiy, Geldrop, NL;
Boris Menchtchikov, Eindhoven, NL;
Scott Anderson Middlebrooks, Duizel, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method controls scanning function of a lithographic apparatus. A monitor wafer is exposed to determine baseline control parameters pertaining to the scanning function. The baseline control parameters are retrieved from the monitor wafer. Parameter drift is determined from the baseline control parameters. Compensation is performed based on the determination. A different parameterization is used for control of the scanning control module than for communication between the scanning control module and the lithographic apparatus.