The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 03, 2015

Filed:

May. 10, 2004
Applicant:

Yih-lin Chung, Taipei, TW;

Inventor:

Yih-Lin Chung, Taipei, TW;

Assignee:

Sunny Pharmtech Inc., New Taipei, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61K 31/192 (2006.01); A61K 31/19 (2006.01); A61K 31/351 (2006.01); A61K 31/166 (2006.01); A61K 38/12 (2006.01);
U.S. Cl.
CPC ...
A61K 38/12 (2013.01); A61K 31/19 (2013.01); A61K 31/192 (2013.01); Y10S 514/928 (2013.01);
Abstract

A method for promoting wound healing and preventing scar formation in a variety of wounds in skin, mucosa, and cornea. The method comprises administering a therapeutically effective amount of a histone deacetylase inhibitor or a hyperacetylating agent. The histone deacetylase inhibitor or hyperacetylating agent is capable of stimulating multiple cytokines/growth factors in the early phase of wound healing, and suppressing fibrogenic cytokines/growth factors in the late phase of tissue remodeling in the wound site, and is useful in promoting epithelial cell re-growth and reducing excessive collagen accumulation, which results in rapid wound closure with reduced scaring.


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