The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2015
Filed:
Feb. 03, 2011
Byeong-beom Kim, Suwon-si, KR;
Je-hyeong Park, Hwaseong-si, KR;
Jae-hyoung Youn, Hwaseong-si, KR;
Jean-ho Song, Yongin-si, KR;
Jong-in Kim, Suwon-si, KR;
Byeong-Beom Kim, Suwon-si, KR;
Je-Hyeong Park, Hwaseong-si, KR;
Jae-Hyoung Youn, Hwaseong-si, KR;
Jean-Ho Song, Yongin-si, KR;
Jong-In Kim, Suwon-si, KR;
Samsung Display Co., Ltd., , KR;
Abstract
A method for forming a thin film according to an exemplary embodiment of the present invention includes forming the thin film at a power density in the range of approximately 1.5 to approximately 3 W/cmand at a pressure of an inert gas that is in the range of approximately 0.2 to approximately 0.3 Pa. This process results in an amorphous metal thin film barrier layer that prevents undesired diffusion from adjacent layers, even when this barrier layer is thinner than many conventional barrier layers.